REACTIVE ION-BEAM ETCHING OF ZNSE USING CL2GAS

被引：0
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作者：
SAITOH, T
YOKOGAWA, T
MUTOH, K
NARUSAWA, T
机构：
来源：
FIRST INTERNATIONAL MEETING ON ADVANCED PROCESSING AND CHARACTERIZATION TECHNOLOGIES: FABRICATION AND CHARACTERIZATION OF SEMICONDUCTOR OPTOELECTRONIC DEVICES AND INTEGRATED CIRCUITS, VOLS 1 AND 2 | 1989年
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TM [电工技术]; TN [电子技术、通信技术];
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0808 ; 0809 ;
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页码：A51 / A54
页数：4
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