CHEMICAL VAPOR-DEPOSITION OF TITANIUM NITRIDE ON CEMENTED CARBIDES

被引：17

作者：

SADAHIRO, T ^{[1
]}

CHO, T ^{[1
]}

YAMAYA, S ^{[1
]}

机构：

[1] TOSHIBA TUNGALOY CO, DEPT TECH, KAWASAKI, JAPAN

来源：

JOURNAL OF THE JAPAN INSTITUTE OF METALS | 1977年 / 41卷 / 06期

关键词：

D O I：

10.2320/jinstmet1952.41.6_542

中图分类号：

学科分类号：

摘要：

引用

页码：542 / 545

页数：4

共 50 条

[1] KINETICS OF CHEMICAL VAPOR-DEPOSITION OF TITANIUM NITRIDE
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[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1990, 137 (01) : 322 - 328
[2] INVESTIGATION OF INTERLAYERS BETWEEN CEMENTED CARBIDES AND TITANIUM CARBIDE COATINGS OBTAINED BY CHEMICAL VAPOR-DEPOSITION
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[J]. THIN SOLID FILMS, 1977, 45 (02) : 265 - 273
[3] NUCLEATION OF ALUMINA LAYERS ON TIC AND CEMENTED CARBIDES BY CHEMICAL VAPOR-DEPOSITION
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[J]. JOURNAL OF CRYSTAL GROWTH, 1975, 28 (02) : 259 - 262
[4] THERMODYNAMIC ANALYSIS FOR THE CHEMICAL VAPOR-DEPOSITION OF NONSTOICHIOMETRIC TITANIUM CARBIDES
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[5] CRYSTAL-GROWTH OF TITANIUM NITRIDE BY CHEMICAL VAPOR-DEPOSITION
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[J]. JOURNAL OF CRYSTAL GROWTH, 1975, 29 (01) : 55 - 60
[6] CHEMICAL VAPOR-DEPOSITION OF TITANIUM NITRIDE ON PLASMA NITRIDED STEEL
WELLS, A
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[J]. JOURNAL OF MATERIALS SCIENCE, 1988, 23 (04) : 1481 - 1485
[7] NONSTOICHIOMETRY OF TITANIUM NITRIDE PLATES PREPARED BY CHEMICAL VAPOR-DEPOSITION
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[J]. JOURNAL OF ALLOYS AND COMPOUNDS, 1993, 190 (02) : 197 - 200
[8] PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF TITANIUM NITRIDE
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[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (08) : C313 - C313
[9] CHEMICAL VAPOR-DEPOSITION OF TITANIUM NITRIDE AT LOW-TEMPERATURES
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[J]. THIN SOLID FILMS, 1986, 140 (02) : 277 - 290
[10] THE SURFACE RESIDUAL-STRESS OF CEMENTED CARBIDES COATED WITH TIC OR TIN BY CHEMICAL VAPOR-DEPOSITION PROCESS AND PHYSICAL VAPOR-DEPOSITION PROCESS
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[J]. JOURNAL OF THE JAPAN INSTITUTE OF METALS, 1985, 49 (02) : 120 - 124

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