ON THE NATURE OF STRUCTURAL RELAXATION IN AMORPHOUS AS2S3

被引:8
|
作者
JACOBSEN, H [1 ]
FORDERER, M [1 ]
BISCHOF, J [1 ]
KASPER, G [1 ]
HUNKLINGER, S [1 ]
TETERIS, J [1 ]
机构
[1] ACAD SCI LASSR,INST PHYS,RIGA 226006,LATVIA,USSR
关键词
D O I
10.1016/S0022-3093(05)80287-X
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We have measured the low-frequency elastic properties of amorphous As2S3-films in the temperature range from 8 mK to 350 K. The samples investigated were treated in four different ways: as-evaporated, illuminated, annealed, and both annealed and illuminated. Around 270 K a huge peak was observed in the internal-friction measurement which was strongly influenced by the sample treatment. In contrast, the behaviour at low temperatures was not affected by the light- and thermally induced structural changes, suggesting that the tunneling entities of the relevant systems are built up by a relatively large number of atoms.
引用
收藏
页码:989 / 992
页数:4
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