INFLUENCE OF ELECTRON-IRRADIATION ON THE HALL-MOBILITY OF HOLES IN INVERSION-LAYERS OF METAL-OXIDE-SEMICONDUCTOR STRUCTURES

被引:0
|
作者
GUZEV, AA
GURTOV, VA
RZHANOV, AV
FRANTSUZOV, AA
机构
来源
SOVIET PHYSICS SEMICONDUCTORS-USSR | 1980年 / 14卷 / 04期
关键词
D O I
暂无
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
引用
收藏
页码:451 / 454
页数:4
相关论文
共 50 条
  • [31] Electron Mobility Enhancement of Extremely Thin Body In0.7Ga0.3As-on-Insulator Metal-Oxide-Semiconductor Field-Effect Transistors on Si Substrates by Metal-Oxide-Semiconductor Interface Buffer Layers
    Kim, SangHyeon
    Yokoyama, Masafumi
    Taoka, Noriyuki
    Iida, Ryo
    Lee, Sunghoon
    Nakane, Ryosho
    Urabe, Yuji
    Miyata, Noriyuki
    Yasuda, Tetsuji
    Yamada, Hisashi
    Fukuhara, Noboru
    Hata, Masahiko
    Takenaka, Mitsuru
    Takagi, Shinichi
    APPLIED PHYSICS EXPRESS, 2012, 5 (01)
  • [32] Electron mobility enhancement of extremely thin body In 0.7Ga0.3As-on-insulator metal-oxide-semiconductor field-effect transistors on Si substrates by metal-oxide-semiconductor interface buffer layers
    Department of Electrical Engineering and Information Systems, University of Tokyo, Bunkyo, Tokyo 113-8656, Japan
    不详
    不详
    Appl. Phys. Express, 1
  • [33] Coulomb and phonon scattering processes in metal-oxide-semiconductor inversion layers: Beyond Matthiessen's rule
    Ishihara, T
    Sano, N
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2005, 44 (4A): : 1682 - 1686
  • [34] Charge buildup by irradiation in metal-oxide-semiconductor structures at cryogenic temperatures: Basic mechanisms and influence of dose and dose rate
    Fourches, NT
    PHYSICAL REVIEW B, 1997, 55 (12) : 7641 - 7652
  • [35] Effective electron mobility in Si inversion layers in metal-oxide-semiconductor systems with a high-κ insulator:: The role of remote phonon scattering (vol 90, pg 4587, 2001)
    Fischetti, MV
    Neumayer, DA
    Cartier, EA
    JOURNAL OF APPLIED PHYSICS, 2002, 91 (01) : 546 - 546
  • [36] Evaluation of Electron and Hole Mobility at Identical Metal-Oxide-Semiconductor Interfaces by using Metal Source/Drain Ge-on-Insulator Metal-Oxide-Semiconductor Field-Effect Transistors
    Morii, Kiyohito
    Dissanayake, Sanjeewa
    Tanabe, Satoshi
    Nakane, Ryosho
    Takenaka, Mitsuru
    Sugahara, Satoshi
    Takagi, Shinichi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2009, 48 (04)
  • [37] Decrease in effective electron mobility in the channel of a metal-oxide-semiconductor transistor as the gate length is decreased
    A. A. Frantsuzov
    N. I. Boyarkina
    V. P. Popov
    Semiconductors, 2008, 42 : 215 - 219
  • [38] Decrease in effective electron mobility in the channel of a metal-oxide-semiconductor transistor as the gate length is decreased
    Frantsuzov, A. A.
    Boyarkina, N. I.
    Popov, V. P.
    SEMICONDUCTORS, 2008, 42 (02) : 215 - 219
  • [39] Effects of gamma-ray irradiation on the electrical characteristics of SiC metal-oxide-semiconductor structures
    Yoshikawa, M
    Ohshima, T
    Itoh, H
    Nashiyama, I
    Takahashi, Y
    Ohnishi, K
    Okumura, H
    Yoshida, S
    ELECTRONICS AND COMMUNICATIONS IN JAPAN PART II-ELECTRONICS, 1998, 81 (10): : 37 - 47
  • [40] Effects of gamma-ray irradiation on the electrical characteristics of SiC metal-oxide-semiconductor structures
    Yoshikawa, Masahito
    Ohshima, Takeshi
    Itoh, Hisayoshi
    Nashiyama, Isamu
    Takahashi, Yoshihiro
    Ohnishi, Kazunori
    Okumura, Hajime
    Yoshida, Sadafumi
    Electronics and Communications in Japan, Part II: Electronics (English translation of Denshi Tsushin Gakkai Ronbunshi), 1998, 81 (10): : 37 - 47