DYNAMICS OF HYDROGEN INTERACTIONS WITH SI(100) AND SI(111) SURFACES

被引:67
|
作者
KOLASINSKI, KW [1 ]
机构
[1] UNIV BIRMINGHAM,SCH CHEM,BIRMINGHAM B15 2TT,W MIDLANDS,ENGLAND
来源
关键词
D O I
10.1142/S0217979295001038
中图分类号
O59 [应用物理学];
学科分类号
摘要
Experimental and theoretical work probing the dynamics of dissociative adsorption and recombinative desorption of hydrogen at Si(100) and Si(111) surfaces is reviewed. Whereas molecular beam experiments demonstrate that molecular excitations do aid in overcoming a substantial activation barrier toward adsorption, desorbed molecules are found to have a total energy content only slightly above the equilibrium expectation at the surface temperature. A consistent interpretation of the ad/desorption dynamics is arrived at which requires neither a violation of microscopic reversibility nor defect-mediated processes. An essential element of this model is that surface atom relaxations play an essential role in the dynamics such that different portions of the potential energy hypersurface govern the results of adsorption and desorption experiments. The 'lost' energy, i.e. that portion of the activation energy not evident in the total energy of the desorbed molecules, is deposited in the surface coordinates where it is inaccessible to experiments that probe the desorbates final state.
引用
收藏
页码:2753 / 2809
页数:57
相关论文
共 50 条
  • [41] Molecular beam investigation of hydrogen dissociation on Si(001) and Si(111) surfaces
    Dürr, M
    Höfer, U
    JOURNAL OF CHEMICAL PHYSICS, 2004, 121 (16): : 8058 - 8067
  • [42] Determination of gas adsorption on native oxides formed in Si(100), Si(111) and Si(110) surfaces
    Mizushima, S
    METROLOGIA, 2005, 42 (04) : 208 - 214
  • [43] DYNAMICS OF CHEMISORPTION SCATTERING OF ATOMIC-HYDROGEN ON PARTIALLY COVERED SI(111) SURFACES
    RICE, BM
    RAFF, LM
    THOMPSON, DL
    SURFACE SCIENCE, 1988, 198 (03) : 360 - 399
  • [44] MEAN RESIDENCE TIME OF LI ATOMS ADSORBED ON SI(100) AND SI(111) SURFACES
    KLEINE, H
    ECKHARDT, M
    FICK, D
    SURFACE SCIENCE, 1995, 329 (1-2) : 71 - 76
  • [45] Comparison of the Growth Processes of Germanium Quantum Dots on the Si(100) and Si(111) Surfaces
    Kokhanenko, A. P.
    Lozovoy, K. A.
    Voitsekhovskii, A. V.
    RUSSIAN PHYSICS JOURNAL, 2018, 60 (11) : 1871 - 1879
  • [46] VIBRATIONAL STUDY OF THE INITIAL-STAGES OF THE OXIDATION OF SI(111) AND SI(100) SURFACES
    IBACH, H
    BRUCHMANN, HD
    WAGNER, H
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1982, 29 (03): : 113 - 124
  • [47] Comparison of the Growth Processes of Germanium Quantum Dots on the Si(100) and Si(111) Surfaces
    A. P. Kokhanenko
    K. A. Lozovoy
    A. V. Voitsekhovskii
    Russian Physics Journal, 2018, 60 : 1871 - 1879
  • [48] SI-SIO2 INTERFACE STRUCTURES ON SI(100), (111), AND (110) SURFACES
    HATTORI, T
    SUZUKI, T
    APPLIED PHYSICS LETTERS, 1983, 43 (05) : 470 - 472
  • [49] Photochemical desorption from chlorinated Si(100) and Si(111) surfaces mechanisms and models
    Rhodin, T
    PROGRESS IN SURFACE SCIENCE, 1995, 50 (1-4) : 131 - 146
  • [50] Ab initio investigation of the adsorption of organic molecules at Si(111) and Si(100) surfaces
    Di Felice, R
    Pignedoli, CA
    Bertoni, CM
    Catellani, A
    Silvestrelli, PL
    Sbraccia, C
    Ancilotto, F
    Palummo, M
    Pulci, O
    SURFACE SCIENCE, 2003, 532 : 982 - 987