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ABLATION PLASMA TEMPERATURE PRODUCED BY INTENSE, PULSED, ION-BEAM EVAPORATION

被引：13
|
作者：
KANG, XD [1 ]
MASUGATA, K [1 ]
YATSUI, K [1 ]
机构：
[1] NAGAOKA UNIV TECHNOL, DEPT ELECT ENG, NAGAOKA, NIIGATA 94021, JAPAN
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1994年 / 33卷 / 7B期
关键词：
ABLATION PLASMA; ION-BEAM EVAPORATION; ION-FLUX MEASUREMENT; PLASMA TEMPERATURE; HYDRODYNAMIC EXPANSION; ENERGY DEPOSITION;
D O I：
10.1143/JJAP.33.L1041
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Characteristics of the ablation plasma produced by an intense, pulsed, ion-beam evaporation which has been known to be very effective in preparing thin films have been evaluated experimentally by measurement of the ion flux. Using the data of ion flux, the ablation plasma temperature (T0) is deduced by an analytic one-dimensional hydrodynamic solution. From the measurement of the ion-beam voltage and the ion-beam current density, the energy deposition per one atom (E(d)) is estimated. The dependence of T0 vs E(d) is studied experimentally and compared with that derived theoretically. Reasonable agreement is obtained between them.
引用
收藏
页码：L1041 / L1043
页数：3
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