FORMATION OF SILICON AND TITANIUM CARBIDES BY CHEMICAL VAPOR DEPOSITION

被引:31
|
作者
PEARCE, ML
MAREK, RW
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D O I
10.1111/j.1151-2916.1968.tb11842.x
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
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页码:84 / &
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