ROLES OF IONS AND NEUTRAL ACTIVE SPECIES IN MICROWAVE PLASMA-ETCHING

被引:47
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作者
SUZUKI, K
OKUDAIRA, S
KANOMATA, I
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D O I
10.1149/1.2129168
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:1024 / 1028
页数:5
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