EXCIMER LASER-INDUCED ETCHING OF SILICON-CARBIDE

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作者：

MURAHARA, M

ARAI, H

MATSUMURA, T

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来源：

LASER- AND PARTICLE-BEAM CHEMICAL PROCESSES ON SURFACES | 1989年 / 129卷

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中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

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页码：315 / 319

页数：5

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