ANTIFERROMAGNETISM IN AMORPHOUS CARBON-FILMS

被引:4
|
作者
MACFARLANE, JM [1 ]
MCLINTOCK, IS [1 ]
ORR, JC [1 ]
机构
[1] UNIV DUNDEE, ISOTOPES LAB, DUNDEE, SCOTLAND
来源
关键词
D O I
10.1002/pssb.2220550128
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
引用
收藏
页码:273 / 278
页数:6
相关论文
共 50 条
  • [41] DIRECT ION-BEAM DEPOSITION OF AMORPHOUS HYDROGENATED CARBON-FILMS
    LOCHER, R
    WILD, C
    KOIDL, P
    [J]. SURFACE & COATINGS TECHNOLOGY, 1991, 47 (1-3): : 426 - 432
  • [42] HIGH-RESOLUTION IMAGES OF AMORPHOUS CARBON-FILMS CONTAINING PLATINUM ATOMS
    TANAKA, M
    MIHAMA, K
    [J]. JOURNAL OF ELECTRON MICROSCOPY, 1972, 21 (03): : 207 - 208
  • [43] PLASMA DEPOSITION OF AMORPHOUS HYDROGENATED CARBON-FILMS ON III-V SEMICONDUCTORS
    POUCH, JJ
    WARNER, JD
    LIU, DC
    ALTEROVITZ, SA
    [J]. THIN SOLID FILMS, 1988, 157 (01) : 97 - 104
  • [44] ELECTRON-DIFFRACTION EVIDENCE FOR THREEFOLD COORDINATION IN AMORPHOUS HYDROGENATED CARBON-FILMS
    MCKENZIE, DR
    BOTTEN, LC
    MCPHEDRAN, RC
    [J]. PHYSICAL REVIEW LETTERS, 1983, 51 (04) : 280 - 283
  • [45] ELECTRICAL-CONDUCTIVITY OF AS-PREPARED AND ANNEALED AMORPHOUS HYDROGENATED CARBON-FILMS
    REYESMENA, A
    GONZALEZHERNANDEZ, J
    ASOMOZA, R
    CHAO, BS
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (03): : 1509 - 1513
  • [46] PROPERTIES OF AMORPHOUS HARD CARBON-FILMS DEPOSITED BY CHEMICAL-VAPOR METHOD
    DURAND, AM
    [J]. VIDE-SCIENCE TECHNIQUE ET APPLICATIONS, 1995, 51 (276): : 177 - &
  • [47] RAMAN-SPECTROSCOPY ON NITROGEN-INCORPORATED AMORPHOUS HYDROGENATED CARBON-FILMS
    MARIOTTO, G
    FREIRE, FL
    ACHETE, CA
    [J]. THIN SOLID FILMS, 1994, 241 (1-2) : 255 - 259
  • [48] CHARACTERIZATION OF PLASMA-DEPOSITED AMORPHOUS HYDROGENATED CARBON-FILMS BY NEUTRON REFLECTIVITY
    GRUNDY, MJ
    RICHARDSON, RM
    ROSER, SJ
    BEAMSON, G
    BRENNAN, WJ
    HOWARD, J
    ONEIL, M
    PENFOLD, J
    SHACKLETON, C
    WARD, RC
    [J]. THIN SOLID FILMS, 1989, 172 (02) : 269 - 282
  • [49] CHEMICAL ETCHING OF AMORPHOUS HYDROGENATED CARBON-FILMS BY HYDROGEN-ATOMS AND IONS
    PHILIPPS, V
    VIETZKE, E
    ERDWEG, M
    FLASKAMP, K
    [J]. PLASMA SURFACE ENGINEERING, VOLS 1 AND 2, 1989, : 1011 - 1016
  • [50] AMORPHOUS HYDROGENATED CARBON-FILMS ON SEMICONDUCTORS .2. MICROSTRUCTURAL PROPERTIES OF THE INTERFACE
    WITTMER, M
    UGOLINI, D
    EITLE, J
    OELHAFEN, P
    [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1989, 48 (06): : 559 - 566