AN ECR ION-SOURCE FOR ION-IMPLANTATION

The lifetime advantage of the filamentless discharge of high-current ECR ion sources is still often diminished through the degradation of the dielectric microwave transmitting window or the antenna. A 2.45 GHz ECR ion source that is now under construction and intended for the production of singly charged ions from reactive or contaminating gases is presented. The microwave power of up to 500 W is coupled into the entirely metallic discharge chamber through a resonant slit. The teflon vacuum sealing window is placed far from the plasma behind a high vacuum waveguide bend and is thus protected from backstreaming electrons and covering source material.