ANOMALOUS BORON PROFILES PRODUCED BY BF2 IMPLANTATION INTO SILICON

被引：18
|
作者：
SIGMON, TW
DELINE, VR
EVANS, CA
KATZ, WM
机构：
[1] UNIV ILLINOIS,DEPT CHEM,URBANA,IL 61801
[2] UNIV ILLINOIS,MAT RES CTR,URBANA,IL 61801
[3] CHARLES EVANS & ASSOCIATES,SAN MATEO,CA 94402
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 04期
关键词：
D O I：
10.1149/1.2129801
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：981 / 982
页数：2
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