SUBSTRATE-TEMPERATURE DEPENDENCE OF TRANSPARENT CONDUCTING AL-DOPED ZNO THIN-FILMS PREPARED BY MAGNETRON SPUTTERING

被引：107

作者：

MINAMI, T

SATO, H

IMAMOTO, H

TAKATA, S

机构：

[1] Electron Device System Laboratory, Kanazawa Institute of Technology, Nonoichi, Ishikawa, 921

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1992年 / 31卷 / 3A期

关键词：

TRANSPARENT ELECTRODE; TRANSPARENT CONDUCTING FILM; AL-DOPED ZNO; DC MAGNETRON SPUTTERING; THIN FILM; SPUTTERING; ZINC OXIDE;

D O I：

10.1143/JJAP.31.L257

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A technique is demonstrated that improves the substrate spatial distributions of resistivity and film thickness of transparent conducting oxide thin films prepared using a conventional dc planar magnetron sputtering method. The spatial distributions of Al-doped ZnO (AZO) films are markedly improved by deposition onto substrates at temperatures above 300-degrees-C. Large-area AZO films with a resistivity of 3-6 x 10(-4) OMEGA . cm can be produced at a substrate temperature of 350-degrees-C.

引用

页码：L257 / L260

页数：4

共 50 条

[41] Effect of deposition temperature on the properties of Al-doped ZnO films prepared by pulsed DC magnetron sputtering for transparent electrodes in thin-film solar cells
Kim, Doo-Soo
Park, Ji-Hyeon
Shin, Beom-Ki
Moon, Kyeong-Ju
Son, Myoungwoo
Ham, Moon-Ho
Lee, Woong
Myoung, Jae-Min
[J]. APPLIED SURFACE SCIENCE, 2012, 259 : 596 - 599
[42] Characterization of transparent conducting Al-doped ZnO thin films and device applications
Lee, Sang Hern
Yu, Young Moon
Kim, Tae Hoon
Jeong, Se-Young
[J]. JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2007, 51 : S79 - S83
[43] High-rate reactive high-power impulse magnetron sputtering of transparent conductive Al-doped ZnO thin films prepared at ambient temperature
Rezek, J.
Novak, P.
Houska, J.
Pajdarova, A. D.
Kozak, T.
[J]. THIN SOLID FILMS, 2019, 679 : 35 - 41
[44] Microstructure and Optical and Electrical Properties of Al-Doped ZnO Thin Films Prepared by RF Magnetron Sputtering Method
Xu Shaoliang
Pang Xiaolu
Yang Huisheng
Zhang Boping
[J]. RARE METAL MATERIALS AND ENGINEERING, 2011, 40 : 451 - 454
[45] Texture analysis of Al-doped ZnO thin films prepared by in-line reactive MF magnetron sputtering
Hong, RJ
Helming, K
Jiang, X
Szyszka, B
[J]. APPLIED SURFACE SCIENCE, 2004, 226 (04) : 378 - 386
[46] Effects of substrate temperatures on the thermal stability of Al-doped ZnO thin films grown by DC magnetron sputtering
Huang, Jinhua
Tan, Ruiqin
Zhang, Yulong
Li, Jia
Yang, Ye
Zhang, Xianpeng
Song, Weijie
[J]. JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2012, 23 (02) : 356 - 360
[47] Effects of substrate temperatures on the thermal stability of Al-doped ZnO thin films grown by DC magnetron sputtering
Jinhua Huang
Ruiqin Tan
Yulong Zhang
Jia Li
Ye Yang
Xianpeng Zhang
Weijie Song
[J]. Journal of Materials Science: Materials in Electronics, 2012, 23 : 356 - 360
[48] Dependence of the Structural, Electrical, and Optical Properties of Al-doped ZnO Films for Transparent Conductors on the Process Atmosphere in Magnetron Sputtering
Yim, Keunbin
Lee, Chongmu
[J]. KOREAN JOURNAL OF MATERIALS RESEARCH, 2005, 15 (08): : 518 - 520
[49] Structural and optical properties of Al-doped ZnO thin films produced by magnetron sputtering
Augusto de Queiroz, Jose Cesar
de Azevedo Filho, Joao Batista
de Medeiros Neto, Jose Quinzinho
Nascimento, Igor Oliveira
de Souza, Ivan Alves
de Oliveira Queiroz, Maria Gerlania
de Melo, Emanuel Benedito
Diniz Melo, Jose Daniel
de Carvalho Costa, Thercio Henrique
[J]. PROCESSING AND APPLICATION OF CERAMICS, 2020, 14 (02) : 119 - 127
[50] Study on transparent conducting ZnO:Al films deposited on organic substrate by RF magnetron sputtering
Yang, Tianlin
Zhang, Deheng
Li, Ziran
Ma, Honglei
Ma, Jin
[J]. Taiyangneng Xuebao/Acta Energiae Solaris Sinica, 1999, 20 (02): : 200 - 203

← 1 2 3 4 5 →