CLASSIFICATION OF INHOMOGENEITIES IN HYDROGENATED AMORPHOUS-SILICON

被引：4
|
作者：
MURAMATSU, S
MATSUBARA, S
WATANABE, T
SHIMADA, T
KAMIYAMA, T
SUZUKI, K
MATSUDA, A
机构：
[1] TOHOKU UNIV, INST MAT RES LAB, SENDAI, MIYAGI 980, JAPAN
[2] ELECTROTECH LAB, TSUKUBA, IBARAKI 305, JAPAN
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1991年 / 30卷 / 12A期
关键词：
A-SI-H; SMALL-ANGLE X-RAY SCATTERING; MEDIUM RANGE ORDER;
D O I：
10.1143/JJAP.30.L2006
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
This paper presents studies of medium range order (MRO) of a-Si:H by small-angle X-ray scattering (SAXS) measurements. Device-quality a-Si:H films prepared by different preparation methods show differences in thermal evolution characteristics of hydrogen and scaling features in SAXS spectra. This suggests that a-Si:H can have several kinds of microstructures, and can therefore be classified by MRO.
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页码：L2006 / L2008
页数：3
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