GROWTH OF LARGE DIAMETER SILICON AND GERMANIUM CRYSTALS BY THE TEAL-LITTLE METHOD

被引：3

|

作者：

RUNYAN, WR

机构：

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 1959年 / 30卷 / 07期

关键词：

D O I：

10.1063/1.1716676

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

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页码：535 / 540

页数：6

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