CLASSIFICATION OF GROWTH-BEHAVIOR FOR COPPER ON VARIOUS SUBSTRATES WITH IN-SITU SCANNING PROBE MICROSCOPY

被引:38
|
作者
NICHOLS, RJ
BUNGE, E
MEYER, H
BAUMGARTEL, H
机构
[1] ATOTECH DEUTSCHLAND GMBH,D-10553 BERLIN,GERMANY
[2] UNIV LIVERPOOL,DEPT CHEM,LIVERPOOL L69 3BX,MERSEYSIDE,ENGLAND
[3] FREE UNIV BERLIN,D-14195 BERLIN,GERMANY
关键词
ATOMIC FORCE MICROSCOPY; COPPER; GOLD; GROWTH; NUCLEATION; SCANNING TUNNELING MICROSCOPY; SINGLE CRYSTAL SURFACES; SOLID-LIQUID INTERFACES;
D O I
10.1016/0039-6028(95)00578-1
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In-situ scanning probe microscopy has been used to directly examine the deposition of copper on gold, polypyrrole and gold substrates which have been precovered with a multilayer copper film. The growth of the copper deposits, from electrolytes with and without additives, have been classified for these different substrates in accordance with Bauer [1] as either: (A) the Stranski-Krastanov mechanism involving the deposition of one or more layers followed by the formation of three-dimensional islands; (B) Frank-van der Merwe layer-by-layer growth of either individual monolayers (B-1); or multilayer films (B-2); or (C) the Volmer-Weber mechanism involving the formation of bulk islands directly on-top of the substrate. We show that the growth behaviour can be rationalised in terms of simple thermodynamic models which take into account, the strength of the deposit-substrate interaction and the crystallographic misfit between the deposit and the underlying substrate surface.
引用
收藏
页码:110 / 119
页数:10
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