ELECTRICAL CHARACTERIZATION OF EPITAXIAL SILICON FILMS FORMED BY A LOW KINETIC-ENERGY PARTICLE PROCESS

被引：15
|
作者：
OHMI, T
IWABUCHI, H
SHIBATA, T
ICHIKAWA, T
机构：
来源：
APPLIED PHYSICS LETTERS | 1989年 / 54卷 / 03期
关键词：
D O I：
10.1063/1.100981
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：253 / 255
页数：3
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