METAL-SILICON INTERFACE FORMATION - THE NI-SI AND PD-SI SYSTEMS

被引：113
|
作者：
GRUNTHANER, PJ
GRUNTHANER, FJ
MADHUKAR, A
MAYER, JW
机构：
[1] UNIV SO CALIF, LOS ANGELES, CA 90007 USA
[2] CORNELL UNIV, ITHACA, NY 14853 USA
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 03期
关键词：
D O I：
10.1116/1.571079
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：649 / 656
页数：8
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