NATURE OF DISLOCATION LOOPS IN AS-IMPLANTED AND POST-ANNEALED SI WAFERS

被引：1
|
作者：
PAVLIDIS, P
ECONOMOU, NA
CHRISTOU, A
机构：
[1] UNIV SALONIKA,PHYS LAB 2,SALONIKA,GREECE
[2] USN,RES LAB,WASHINGTON,DC 20375
来源：
JOURNAL OF APPLIED PHYSICS | 1977年 / 48卷 / 08期
关键词：
D O I：
10.1063/1.324166
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：3612 / 3613
页数：2
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