DEPOSITION OF THIN-FILMS BY DECOMPOSITION OF TETRA-ETHOXY SILANE IN A RADIO-FREQUENCY GLOW-DISCHARGE

被引：101

作者：

MUKHERJEE, SP ^{[1
]}

EVANS, PE ^{[1
]}

机构：

[1] UNIV MANCHESTER, INST SCI & TECHNOL, MANCHESTER, LANCASHIRE, ENGLAND

来源：

THIN SOLID FILMS | 1972年 / 14卷 / 01期

关键词：

D O I：

10.1016/0040-6090(72)90373-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：105 / 118

页数：14

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[1] REACTION-MECHANISMS OF THE RADIO-FREQUENCY GLOW-DISCHARGE DEPOSITION PROCESS IN SILANE-HELIUM
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[8] PROPERTIES OF THIN-FILMS POLYMERIZED BY GLOW-DISCHARGE
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