The effect of strain on the electronic properties of MoS2 monolayers

被引:3
|
作者
Park, Soon-Dong [1 ]
Kim, Sung Youb [2 ]
机构
[1] Ulsan Natl Inst Sci & Technol, Sch Mat Sci & Engn, 50 UNIST Gil, Ulsan 689798, South Korea
[2] Ulsan Natl Inst Sci & Technol, Dept Mech Engn, 50 UNIST Gil, Ulsan 689798, South Korea
来源
基金
新加坡国家研究基金会;
关键词
molybdenum disulfide; density functional theory; mechanical strain; band gap engineering;
D O I
10.12989/mmm.2016.1.1.077
中图分类号
O3 [力学];
学科分类号
08 ; 0801 ;
摘要
We utilize first-principles calculations within density-functional theory to investigate the possibility of strain engineering in the tuning of the band structure of two-dimensional MoS2. We find that the band structure of MoS2 monolayers transits from direct to indirect when mechanical strain is applied. In addition, we discuss the change in the band gap energy and the critical stains for the direct-to-indirect transition under various strains such as uniaxial, biaxial, and pure shear. Biaxial strain causes a larger change, and the pure shear stain causes a small change in the electronic band structure of the MoS2 monolayer. We observe that the change in the interaction between molecular orbitals due to the mechanical strain alters the band gap type and energy.
引用
收藏
页码:77 / 86
页数:10
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