HIGH-QUALITY EPITAXIAL-GROWTH ON INSITU PATTERNED INP SUBSTRATES

被引:2
|
作者
TEMKIN, H
HARRIOTT, LR
WEINER, J
HAMM, RA
PANISH, MB
机构
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D O I
10.1557/PROC-145-39
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
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页码:39 / 46
页数:8
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