GAINASP-INP INTEGRATED TWIN-GUIDE LASERS WITH 1ST-ORDER DISTRIBUTED BRAGG REFLECTORS AT 1.3 MU-M WAVELENGTH

被引：79

|

作者：

UTAKA, K

SUEMATSU, Y

KOBAYASHI, K

KAWANISHI, H

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1980年 / 19卷 / 03期

关键词：

D O I：

10.1143/JJAP.19.L137

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

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页码：L137 / L140

页数：4

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共 48 条

[41] High-reflectivity AlAsSb/In(Ga1-xAlx)As distributed Bragg reflectors on InP substrates for 1.3-1.5 mu m wavelengths
Asai, H
Iwamura, H
COMPOUND SEMICONDUCTORS 1995, 1996, 145 : 985 - 990
[42] DFB RIDGE WAVE-GUIDE LASERS AT LAMBDA= 1.5 MU-M WITH 1ST-ORDER GRATINGS FABRICATED USING ELECTRON-BEAM LITHOGRAPHY
ARMISTEAD, CJ
BUTLER, BR
CLEMENTS, SJ
COLLAR, AJ
MOULE, DJ
WHEELER, SA
FICE, MJ
AHMED, H
ELECTRONICS LETTERS, 1987, 23 (11) : 592 - 593
[43] FAST DIRECT E-BEAM LITHOGRAPHIC FABRICATION OF 1ST-ORDER GRATINGS FOR 1.3-MU-M DFB LASERS
GOZDZ, AS
LIN, PSD
SCHERER, A
LEE, SF
ELECTRONICS LETTERS, 1988, 24 (02) : 123 - 125
[44] ROOM-TEMPERATURE CW OPERATION OF 1.60 MU-M GAINASP INP BURIED-HETEROSTRUCTURE INTEGRATED LASER WITH BUTT JOINTED BUILT IN DISTRIBUTED BRAGG REFLECTION WAVEGUIDE
ABE, Y
KISHINO, K
TANBUNEK, T
ARAI, S
KOYAMA, F
MATSUMOTO, K
WATANABE, T
SUEMATSU, Y
ELECTRONICS LETTERS, 1982, 18 (10) : 410 - 411
[45] FABRICATION OF 1ST-ORDER GRATINGS FOR 1.5 MU-M DFB LASERS BY HIGH-VOLTAGE ELECTRON-BEAM LITHOGRAPHY
FICE, MJ
AHMED, H
CLEMENTS, S
ELECTRONICS LETTERS, 1987, 23 (11) : 590 - 592
[46] REALIZATION OF HIGH COUPLING-COEFFICIENTS IN 1.53-MU-M INGAASP/INP 1ST-ORDER QUARTER-WAVE SHIFTED DISTRIBUTED FEEDBACK LASERS
HILLMER, H
HANSMANN, S
BURKHARD, H
APPLIED PHYSICS LETTERS, 1990, 57 (06) : 534 - 536
[47] 1.3 MU-M GAINASP-INP BURIED HETEROSTRUCTURE GRADED INDEX SEPARATE CONFINEMENT MULTIPLE QUANTUM WELL (BH-GRIN-SC-MQW) LASERS ENTIRELY GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION (MOCVD)
KASUKAWA, A
IMAJO, Y
MAKINO, T
ELECTRONICS LETTERS, 1989, 25 (02) : 104 - 105
[48] NARROW-LINEWIDTH 1.3-MU-M DFB-DCPBH LASERS WITH LAMBDA/4-SHIFTED 1ST-ORDER GRATINGS FABRICATED BY ELECTRON-BEAM LITHOGRAPHY USING A NEW FAST RESIST
ZAH, CE
CANEAU, C
MENOCAL, SG
LIN, PSD
GOZDZ, AS
FAVIRE, F
LEE, TP
ELECTRONICS LETTERS, 1988, 24 (02) : 94 - 96

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