ION-MOLECULE EQUILIBRIA IN MIXTURES OF N2 AND AR

被引：71
|
作者：
TENG, HH [1 ]
CONWAY, DC [1 ]
机构：
[1] TEXAS A&M UNIV,DEPT CHEM,COLLEGE STN,TX 77843
来源：
JOURNAL OF CHEMICAL PHYSICS | 1973年 / 59卷 / 05期
关键词：
D O I：
10.1063/1.1680338
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
收藏
页码：2316 / 2323
页数：8
相关论文
共 50 条
  • [41] APPLICATION OF SIGNIFICANT STRUCTURE THEORY TO BINARY LIQUID MIXTURES - AR + N2 AR + O2 AND O2 + N2
    MINER, BA
    EYRING, H
    PROCEEDINGS OF THE NATIONAL ACADEMY OF SCIENCES OF THE UNITED STATES OF AMERICA, 1965, 53 (06) : 1227 - &
  • [42] ION-MOLECULE REACTIONS IN ACETYLENE AND ACETYLENE-METHANE MIXTURES
    MYHER, JJ
    HARRISON, AG
    CANADIAN JOURNAL OF CHEMISTRY, 1968, 46 (10): : 1755 - &
  • [43] ION-MOLECULE REACTIONS IN NO-NH3 GAS MIXTURES
    PUCKETT, LJ
    TEAGUE, MW
    JOURNAL OF CHEMICAL PHYSICS, 1971, 54 (11): : 4860 - &
  • [44] ION-MOLECULE REACTIONS IN HYDROGEN-RARE-GAS MIXTURES
    AQUILANTI, V
    GALLI, A
    GIARDINI.A
    VOLPI, GG
    JOURNAL OF CHEMICAL PHYSICS, 1965, 43 (06): : 1969 - +
  • [45] Gas phase ion-molecule reactions in phosphine/silane mixtures
    Antoniotti, P
    Operti, L
    Rabezzana, R
    Vaglio, GA
    Volpe, P
    Gal, JF
    Grover, R
    Maria, PC
    JOURNAL OF PHYSICAL CHEMISTRY, 1996, 100 (01): : 155 - 162
  • [46] REPULSIVE POTENTIAL OF INTERACTION BETWEEN N2 MOLECULE AND AR ATOM
    GAIDAENK.VI
    DOKLADY AKADEMII NAUK SSSR, 1973, 211 (01): : 67 - 68
  • [47] Technical characteristics of a DC plasma jet with Ar/N2 and O2/N2 gaseous mixtures
    Barkhordari, Ali
    Ganjovi, Alireza
    CHINESE JOURNAL OF PHYSICS, 2019, 57 : 465 - 478
  • [48] FAST AND SLOW-ELECTRONS IN LIQUID AR AND N2 MIXTURES
    KIMURA, T
    SAKAI, Y
    TAGASHIRA, H
    NAKAMURA, S
    IEEE TRANSACTIONS ON DIELECTRICS AND ELECTRICAL INSULATION, 1994, 1 (04) : 644 - 647
  • [49] CONCURRENT ION-MOLECULE REACTIONS .2. REACTIONS IN X-D2 MIXTURES
    SHANNON, TW
    HARRISON, AG
    JOURNAL OF CHEMICAL PHYSICS, 1965, 43 (12): : 4206 - &
  • [50] Measurement of ion temperature in ECR Ar/N2 plasma
    Koga, M
    Yonesu, A
    Kawai, Y
    SURFACE & COATINGS TECHNOLOGY, 2003, 171 (1-3): : 216 - 221
12345