X-RAY PHOTOELECTRON-SPECTROSCOPY INVESTIGATION ON THE CHEMICAL-STRUCTURE OF AMORPHOUS-SILICON NITRIDE (A-SINX)

被引：127

作者：

INGO, GM

ZACCHETTI, N

DELLASALA, D

COLUZZA, C

机构：

[1] ENIRICERCHE SPA,I-00015 ROME,ITALY

[2] UNIV LA SAPIENZA,DIPARTIMENTO FIS,I-00185 ROME,ITALY

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 05期

关键词：

D O I：

10.1116/1.576314

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：3048 / 3055

页数：8

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