SURFACE MODIFICATION BY ION-BOMBARDMENT

In recent years the production of thin high-quality films has become more and more important. At the University of Giessen, radiofrequency ion sources for material treatment (RIM) had been designed and optimized. The presented results show some of our analyses of RIM-produced thin films and RIM-modified surfaces. By means of an oscillating quartz crystal, the distribution of sputtered atoms and the properties of the growing thin film were measured. Furthermore, the formation of seed textures on the sputtered surfaces were analyzed.