CHEMICALLY-INDUCED GRAIN-BOUNDARY MIGRATION IN DOPED POLYCRYSTALLINE SILICON FILMS

被引：3
|
作者：
TU, KN
TERSOFF, J
CHOU, TC
WONG, CY
机构：
来源：
SOLID STATE COMMUNICATIONS | 1988年 / 66卷 / 01期
关键词：
D O I：
10.1016/0038-1098(88)90499-1
中图分类号：
O469 [凝聚态物理学];
学科分类号：
070205 ;
摘要：
引用
收藏
页码：93 / 97
页数：5
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