FIELD-DEPENDENT ELECTRON-MOBILITY IN SILICON BETWEEN 8 AND 77 K - A SEMI-EMPIRICAL MODEL

被引:3
|
作者
DELOSSANTOS, H
GRAY, JL
机构
[1] Purdue Univ, West Lafayette, IN, USA
关键词
COMPUTER SIMULATION - ELECTRIC FIELD EFFECTS - ELECTRONS - MATHEMATICAL MODELS - MATHEMATICAL STATISTICS -- Monte Carlo Methods;
D O I
10.1109/16.7412
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The development of a semiempirical model that predicts the electron mobility in silicon as a function of the electric field in the direction, the doping density, and the temperature for the temperature range 8 to 77 K is discussed. The approach integrates empirical formulas relating drift velocity and mobility to electric field, experimental data for hyperpure silicon at low temperatures, a theory of scattering rate scaling, and the simulation of electron transport, using the Monte Carlo method. Figures showing the resulting electron drift velocity under various conditions of doping and temperature are included.
引用
收藏
页码:1972 / 1976
页数:5
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