MONITORING OXYGEN AND WATER-VAPOR IN CONTROLLED ATMOSPHERE MATERIALS PROCESSING

被引：0

作者：

WEISSBAR.J ^{[1
]}

机构：

[1] APPL ELECTROCHEM INC,SUNNYVALE,CA

来源：

AMERICAN CERAMIC SOCIETY BULLETIN | 1973年 / 52卷 / 09期

关键词：

D O I：

暂无

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：716 / 716

页数：1

共 50 条

[41] HIGH-PRESSURE THERMAL-OXIDATION OF N-GAAS IN AN ATMOSPHERE OF OXYGEN AND WATER-VAPOR
BASU, N
BHAT, KN
JOURNAL OF APPLIED PHYSICS, 1988, 63 (11) : 5500 - 5506
[42] DO DESERT PLANTS ABSORB WATER-VAPOR FROM THE ATMOSPHERE
VOZNESENSKII, VL
SOVIET PLANT PHYSIOLOGY, 1988, 35 (02): : 259 - 262
[43] MICROWAVE MEASUREMENTS OF THE ABSOLUTE VALUES OF ABSORPTION BY WATER-VAPOR IN THE ATMOSPHERE
HOGG, DC
GUIRAUD, FO
NATURE, 1979, 279 (5712) : 408 - 409
[44] HIGH-TEMPERATURE OXIDATION OF HAFNIUM IN A WATER-VAPOR ATMOSPHERE
DYACHKOV, VI
JOURNAL OF APPLIED CHEMISTRY OF THE USSR, 1991, 64 (12): : 2396 - 2401
[45] RESISTANCE OF LIPID FILMS TO THE TRANSMISSION OF WATER-VAPOR AND OXYGEN
FENNEMA, OR
KESTER, JJ
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1989, 197 : 71 - AGFD
[46] OXIDATION OF SINTERED ALUMINUM NITRIDE BY OXYGEN AND WATER-VAPOR
KUROMITSU, Y
YOSHIDA, H
OHNO, S
MASUDA, H
TAKEBE, H
MORINAGA, K
NIPPON SERAMIKKUSU KYOKAI GAKUJUTSU RONBUNSHI-JOURNAL OF THE CERAMIC SOCIETY OF JAPAN, 1992, 100 (01): : 70 - 74
[47] THE EFFECT OF WATER-VAPOR AND OXYGEN IN THE PROCESSING ENVIRONMENT ON THE PROPERTIES OF SPUTTERED A-SI-H FILMS
WANG, C
PARSONS, GN
LUCOVSKY, G
AMORPHOUS SILICON TECHNOLOGY - 1989, 1989, 149 : 75 - 80
[48] AMBIENTS PRODUCED BY OXYGEN AND WATER-VAPOR IN UHV SYSTEMS
QUINN, JJ
ELLIOTT, RB
VACUUM, 1977, 27 (7-8) : 473 - 479
[49] OXYGEN ABSORPTION BY VANADIUM, NIOBIUM AND TANTALUM IN WATER-VAPOR
JEHN, H
HORZ, G
ZEITSCHRIFT FUR METALLKUNDE, 1976, 67 (06): : 417 - 421
[50] WATER-VAPOR CORRECTIONS IN OXYGEN-CONSUMPTION CALCULATIONS
BEAVER, WL
JOURNAL OF APPLIED PHYSIOLOGY, 1973, 35 (06) : 928 - 931

← 1 2 3 4 5 →