CHEMICAL VAPOR-DEPOSITION OF GOLD

The authors report preliminary results showing that high-purity gold films can also be deposited by large-area chemical vapor deposition (CVD) from this complex as well as from two fluorinated derivatives, dimethyl-(1,1,1-trifluoro-2,4-pentandionato) gold (III) and dimethyl-(1,1,1,5,5,5-hexafluoro-2,4-pentandionato) gold (III), Me//2Au(tfac) and Me//2Au(hfac), respectively. We discuss the conditions of deposition and the quality of the gold films obtained as well as the properties of the organogold precursors. Experimental results show that Me//2Au(acac), Me//2Au(tfac), and Me//2Au(hfac) are shown to be excellent precursors for CVD of gold.