APPLICATION OF MEV HEAVY-ION MICROPROBES FOR PIXE MEASUREMENTS

被引：0
|
作者：
MOKUNO, Y
HORINO, Y
CHAYAHARA, A
KIUCHI, M
FUJII, K
SATOU, M
TAKAI, M
机构：
[1] OSAKA UNIV,EXTREME MAT RES CTR,TOYONAKA,OSAKA 560,JAPAN
[2] OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1993年 / 77卷 / 1-4期
关键词：
D O I：
暂无
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
MeV heavy ion microprobes, 3 MeV C2+, Si2+ and Ni2+ Were applied for micro-PIXE measurements for aluminium, silicon, copper, silver and gold substrates. To compare with the case of light ions, a 2 MeV H+ microbeam was also employed. It was found that the X-ray yields vary drastically as a function of the combination of the atomic number of incident ions and target atoms. This indicates that there is an optimum combination for specific element analysis. The minimum detectable gold weights in silicon were also estimated for a practical case and it was found that a r-arbon beam was best for measuring gold atoms in silicon.
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页码：128 / 131
页数：4
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