CONTINUOUS CVD PROCESS FOR COATING FILAMENTS WITH TANTALUM CARBIDE

被引：0
|
作者：
HEFFERNA.WJ [1 ]
AHMAD, I [1 ]
HASKELL, RW [1 ]
机构：
[1] MAGGS RES CTR,WATERVLIET ARSENAL,WATERVLIET,NY 12189
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1973年 / 120卷 / 08期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
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页码：C248 / C248
页数：1
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