ROTATIONAL HYSTERESIS AND MAGNETIZATION CURLING OF FE-AL THIN-FILMS OBTAINED BY MAGNETRON SPUTTERING

被引:0
|
作者
LUCA, D
SOROHAN, M
机构
[1] Faculty of Physics, Al. I. Cuza University
关键词
D O I
10.1016/0304-8853(95)00168-9
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Magnetic characteristics (magnetization, magnetic anisotropy, rotational hysteresis energy loss, rotational hysteresis integral) of Fe100-xAlx films have been measured (for x = 18.2 and 24.2) to further make clear the effect of atomic ordering on their macroscopic properties. The results are discussed in terms of the presence of a fine-domain DO3 ordered phase, dispersed within a disordered a matrix. The rotational hysteresis loss dependence W-r = f(H) shows a two-peak shape and anisotropy fields have been inferred corresponding to the two phases. The shape anisotropy energy of the dispersed ordered domains (5.5 X 10(7) erg/cm(3)), as well as of the matrix (less than or equal to 1.5 X 10(4) erg/cm(3)) have been evaluated. The volume fractions of the ordered domains were calculated as 0,19% and 0.23% for x = 18.2 and 24.2 respectively. The experimental results suggest that the changes in magnetization of the investigated films occur mainly by curling mechanism.
引用
收藏
页码:104 / 105
页数:2
相关论文
共 50 条
  • [1] Rotational hysteresis and magnetization curling of Fe-Al thin films obtained by magnetron sputtering
    Al.I. Cuza Univ, Iasi, Romania
    J Magn Magn Mater, 1-2 (104-105):
  • [2] MICROSTRUCTURAL CHARACTERIZATION OF FE-AL THIN-FILMS
    BONETTI, E
    ENZO, S
    SBERVEGLIERI, G
    VALDRE, G
    GROPPELLI, S
    THIN SOLID FILMS, 1991, 204 (02) : 377 - 384
  • [3] TITANIUM CARBIDE THIN-FILMS OBTAINED BY REACTIVE MAGNETRON SPUTTERING
    GEORGIEV, G
    FESCHIEV, N
    POPOV, D
    UZUNOV, Z
    VACUUM, 1986, 36 (10) : 595 - 597
  • [4] SYNTHESIS OF NB3AL THIN-FILMS BY MAGNETRON SPUTTERING
    TANABE, K
    MICHIKAMI, O
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (05) : L359 - L362
  • [5] THE MAGNETIC-BEHAVIOR OF FE3AL THIN-FILMS OBTAINED BY CATHODIC SPUTTERING
    TUTOVAN, V
    LUCA, D
    APPLIED SURFACE SCIENCE, 1993, 65-6 : 145 - 148
  • [6] SILVER THIN-FILMS DEPOSITED BY MAGNETRON SPUTTERING
    MARECHAL, N
    QUESNEL, E
    THIN SOLID FILMS, 1994, 241 (1-2) : 34 - 38
  • [7] LABX THIN-FILMS PREPARED BY MAGNETRON SPUTTERING
    KINBARA, A
    NAKANO, T
    KOBAYASHI, A
    BABA, S
    KAJIWARA, T
    APPLIED SURFACE SCIENCE, 1993, 70-1 (1 -4 pt B) : 742 - 745
  • [8] STUDY OF FE-AL THIN-FILMS OXIDIZED AT ROOM-TEMPERATURE
    CARBUCICCHIO, M
    PALOMBARINI, G
    BERTONCELLO, R
    GLISENTI, A
    TONDELLO, E
    SBERVEGLIERI, G
    HYPERFINE INTERACTIONS, 1993, 78 (1-4): : 327 - 331
  • [9] OXYGEN INCORPORATION IN AL THIN-FILMS DURING DEPOSITION BY DC MAGNETRON SPUTTERING
    POPOV, DN
    KOTLAROVA, TK
    UZUNOV, TD
    GAYDAROVA, VN
    VACUUM, 1988, 38 (11) : 1015 - 1017
  • [10] TANTALUM SILICIDE THIN-FILMS OBTAINED BY SPUTTERING
    DEMPSEY, J
    DHEURLE, F
    IRENE, E
    PETERSSON, S
    JOURNAL OF ELECTRONIC MATERIALS, 1979, 8 (05) : 721 - 721