SPECTROPHOTOMETRIC THICKNESS MEASUREMENT FOR VERY THIN SIO2 FILMS ON SI

被引：17
|
作者：
RAND, MJ
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1970年 / 41卷 / 02期
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D O I：
10.1063/1.1658750
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：787 / &
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