TRANSIENT EFFECT OF CO2-LASER ON DENTINAL PERMEABILITY (HYPERSENSITIVITY)

被引:0
|
作者
FAYAD, M
LIEBOW, C
机构
[1] SUNY BUFFALO, DEPT ORAL SURG, BUFFALO, NY 14260 USA
[2] SUNY BUFFALO, DEPT ENDOCRINOL, BUFFALO, NY 14260 USA
[3] CAIRO UNIV, CAIRO, EGYPT
关键词
D O I
暂无
中图分类号
R78 [口腔科学];
学科分类号
1003 ;
摘要
引用
收藏
页码:195 / 195
页数:1
相关论文
共 50 条
  • [41] COMPACT CO2-LASER
    OSIPOV, VV
    SLOBODYANYUK, PA
    TELNOV, VA
    INSTRUMENTS AND EXPERIMENTAL TECHNIQUES, 1978, 21 (01) : 211 - 213
  • [42] CO2-LASER SAFETY
    VERNICK, DM
    LARYNGOSCOPE, 1990, 100 (01): : 108 - 109
  • [43] CO2-LASER LAPAROSCOPY
    BRUHAT, MA
    WATTIEZ, A
    MAGE, G
    POULY, JL
    CANIS, M
    BAILLIERES CLINICAL OBSTETRICS AND GYNAECOLOGY, 1989, 3 (03): : 487 - 497
  • [44] ROLE OF POPULATION NOISE ON THE TRANSIENT STATISTICS OF A CO2-LASER NEAR THRESHOLD
    CIOFINI, M
    MEUCCI, R
    WANG, PY
    ARECCHI, FT
    EUROPHYSICS LETTERS, 1993, 21 (07): : 735 - 740
  • [45] Visualization of transient phenomena during the interaction of pulsed CO2-laser radiation
    Schmitt, R
    Hugenschmidt, M
    FUNDAMENTALS OF LASER-MATTER INTERACTION: ICONO '95, 1996, 2796 : 260 - 266
  • [46] TRANSIENT PLASMA DIAGNOSTICS USING SIMULTANEOUS CO2-LASER INTERFEROMETRY AND ABSORPTION
    OFFENBER.AA
    KERR, RD
    JOURNAL OF APPLIED PHYSICS, 1972, 43 (02) : 354 - &
  • [47] THE TRANSIENT EVOLUTION OF AM MODE-LOCKING A TEA CO2-LASER
    VANGOOR, FA
    BONNIE, RJM
    WITTEMAN, WJ
    IEEE JOURNAL OF QUANTUM ELECTRONICS, 1985, 21 (11) : 1772 - 1776
  • [48] CO2-LASER INTERFEROMETER FOR MEASUREMENT OF TRANSIENT LOW-DENSITY PLASMAS
    HEROLD, H
    JAHODA, FC
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1969, 40 (01): : 145 - &
  • [49] COHERENT TRANSIENT EFFECTS USING A FREQUENCY-SWITCHED CO2-LASER
    SHOEMAKER, RL
    SCOTTI, RE
    COMASKEY, B
    JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1978, 68 (10) : 1388 - 1388
  • [50] Transient electric current induced in alumina ceramic by CO2-laser irradiation
    Kano, S
    Enomoto, Y
    ICALEO'96 - PROCEEDINGS OF THE LASER MATERIALS PROCESSING CONFERENCE, 1996, 81 : B11 - B19