193 NM PHOTODISSOCIATION DYNAMICS OF CHLOROETHYLENES

被引:0
|
作者
YANG, YA [1 ]
HE, GX [1 ]
HUANG, Y [1 ]
REILLY, PTA [1 ]
GORDON, RJ [1 ]
机构
[1] UNIV ILLINOIS,DEPT CHEM,CHICAGO,IL 60680
关键词
D O I
暂无
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
引用
收藏
页码:175 / PHYS
相关论文
共 50 条
  • [41] Dynamics of HCN, HNC, and HNCO Formation in the 193 nm Photodissociation of Formamide
    Caster, Kacee L.
    Seifert, Nathan A.
    Ruscic, Branko
    Jasper, Ahren W.
    Prozument, Kirill
    JOURNAL OF PHYSICAL CHEMISTRY A, 2024, 128 (37): : 7761 - 7771
  • [42] Photodissociation dynamics of dicyclopropyl ketone at 193 nm: Isomerization of the cyclopropyl ligand
    Clegg, SM
    Parsons, BF
    Klippenstein, SJ
    Osborn, DL
    JOURNAL OF CHEMICAL PHYSICS, 2003, 119 (14): : 7222 - 7236
  • [43] Photodissociation dynamics of propyne at 193 nm: a trajectory surface hopping study
    Ghosh, Subhendu
    Rauta, Akshaya Kumar
    Maiti, Biswajit
    PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 2016, 18 (11) : 8219 - 8227
  • [44] 193-NM PHOTODISSOCIATION OF ACETYLENE
    BALKO, BA
    ZHANG, J
    LEE, YT
    JOURNAL OF CHEMICAL PHYSICS, 1991, 94 (12): : 7958 - 7966
  • [45] THE PHOTODISSOCIATION OF PHENYLSILANE AT 193-NM
    BAGGOTT, JE
    FREY, HM
    LIGHTFOOT, PD
    WALSH, R
    CHEMICAL PHYSICS LETTERS, 1986, 125 (01) : 22 - 26
  • [46] The 193-nm photodissociation of NCO
    Gómez, S
    Lambert, HM
    Houston, PL
    JOURNAL OF PHYSICAL CHEMISTRY A, 2001, 105 (26): : 6342 - 6352
  • [47] Photodissociation of cyclopropyl cyanide at 193 nm
    Oh, CY
    Shin, SK
    Kim, HL
    Park, CR
    CHEMICAL PHYSICS LETTERS, 2002, 363 (3-4) : 404 - 408
  • [48] Photodissociation of acrylic acid at 193 nm
    Kitchen, DC
    Forde, NR
    Butler, LJ
    JOURNAL OF PHYSICAL CHEMISTRY A, 1997, 101 (36): : 6603 - 6610
  • [49] THE PHOTODISSOCIATION OF PYRIDINE AT 193-NM
    PRATHER, KA
    LEE, YT
    ISRAEL JOURNAL OF CHEMISTRY, 1994, 34 (01) : 43 - 53
  • [50] THE CONCERTED PHOTODISSOCIATION OF AZOMETHANE AT 193 NM
    GEJO, T
    FELDER, P
    HUBER, JR
    CHEMICAL PHYSICS, 1995, 195 (1-3) : 423 - 433