ION-ASSISTED DEPOSITION OF MIXED TIO2-SIO2 FILMS

被引：113
|
作者：
NETTERFIELD, RP [1 ]
MARTIN, PJ [1 ]
PACEY, CG [1 ]
SAINTY, WG [1 ]
MCKENZIE, DR [1 ]
AUCHTERLONIE, G [1 ]
机构：
[1] UNIV SYDNEY,SYDNEY,NSW 2006,AUSTRALIA
来源：
JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 04期
关键词：
D O I：
10.1063/1.344352
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：1805 / 1809
页数：5
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