MOSSBAUER CHARACTERIZATION OF REACTIVELY SPUTTERED IRON NITRIDE FILMS

被引：12

作者：

LO, C ^{[1
]}

KRISHNASWAMY, SV ^{[1
]}

MESSIER, R ^{[1
]}

RAO, KRPM ^{[1
]}

MULAY, LN ^{[1
]}

机构：

[1] PENN STATE UNIV,MAT RES LAB,UNIVERSITY PK,PA 16802

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 18卷 / 02期

关键词：

D O I：

10.1116/1.570749

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：313 / 317

页数：5

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