MICROHARDNESS AND STRUCTURE OF REACTIVE ION-PLATED CHROMIUM-CARBON FILMS

被引:7
|
作者
BEWILOGUA, K
BUGIEL, E
RAU, B
SCHURER, C
WEISSMANTEL, C
机构
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D O I
10.1002/crat.19800151025
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
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页码:1205 / 1212
页数:8
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