EFFECT OF SILICON DIOXIDE ON THE THERMAL-DIFFUSIVITY OF ALUMINUM NITRIDE CERAMICS

被引：0
|
作者：
YAGI, T [1 ]
SHINOZAKI, K [1 ]
ISHIZAWA, N [1 ]
MIZUTANI, N [1 ]
KATO, M [1 ]
TSUGE, A [1 ]
机构：
[1] TOSHIBA CORP,CTR RES & DEV,KAWASAKI,KANAGAWA 210,JAPAN
来源：
JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1988年 / 71卷 / 07期
关键词：
D O I：
暂无
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：C334 / C338
页数：5
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