THE CRYSTALLOGRAPHIC PROPERTIES OF PBTIO3 THIN-FILMS FABRICATED BY CHEMICAL VAPOR-DEPOSITION

被引:0
|
作者
YOON, SG
KIM, HG
机构
[1] Korea Inst of Science and Technology, Seoul, South Korea, Korea Inst of Science and Technology, Seoul, South Korea
关键词
Compendex;
D O I
暂无
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
FERROELECTRIC MATERIALS
引用
收藏
页码:2059 / 2063
页数:5
相关论文
共 50 条
  • [1] METALORGANIC CHEMICAL VAPOR-DEPOSITION OF PBTIO3 THIN-FILMS
    KWAK, BS
    BOYD, EP
    ERBIL, A
    APPLIED PHYSICS LETTERS, 1988, 53 (18) : 1702 - 1704
  • [2] GROWTH AND PROPERTIES OF PBTIO3 THIN-FILMS BY PHOTOENHANCED CHEMICAL VAPOR-DEPOSITION
    KATAYAMA, T
    FUJIMOTO, M
    SHIMIZU, M
    SHIOSAKI, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (9B): : 2189 - 2192
  • [3] PREPARATION AND DEPOSITION MECHANISM OF FERROELECTRIC PBTIO3 THIN-FILMS BY CHEMICAL VAPOR-DEPOSITION
    YOON, SG
    KIM, HG
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (12) : 3137 - 3140
  • [4] EPITAXIAL PBTIO3 THIN-FILMS GROWN BY ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION
    DEKEIJSER, M
    DORMANS, GJM
    CILLESSEN, JFM
    DELEEUW, DM
    ZANDBERGEN, HW
    APPLIED PHYSICS LETTERS, 1991, 58 (23) : 2636 - 2638
  • [5] PREPARATION OF PBTIO3 THIN-FILMS BY SPUTTER ASSISTED PLASMA CHEMICAL VAPOR-DEPOSITION METHOD
    MOCHIZUKI, S
    KIMURA, S
    MAKABE, R
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1989, 28 : 15 - 17
  • [6] DIFFERENCE RAMAN-SPECTRA OF PBTIO3 THIN-FILMS GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION
    FENG, ZC
    KWAK, BS
    ERBIL, A
    BOATNER, LA
    APPLIED PHYSICS LETTERS, 1993, 62 (04) : 349 - 351
  • [7] EFFECTS OF THE REACTION PRESSURE ON THE GROWTH OF PBTIO3 THIN-FILMS BY THE PHOTOCHEMICAL VAPOR-DEPOSITION METHOD
    ANDO, A
    KATAYAMA, T
    SHIMIZU, M
    SHIOSAKI, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1992, 31 (9B): : 3001 - 3004
  • [9] PREPARATION OF PBTIO3 FERROELECTRIC THIN-FILM BY CHEMICAL VAPOR-DEPOSITION
    NAKAGAWA, T
    YAMAGUCHI, J
    OKUYAMA, M
    HAMAKAWA, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1982, 21 (10): : L655 - L656
  • [10] PBTIO3 THIN-FILMS PREPARED BY METALORGANIC CHEMICAL-VAPOR-DEPOSITION ON LAALO3
    CHEN, YF
    YU, T
    CHEN, JX
    SHUN, L
    LI, P
    MING, NB
    APPLIED PHYSICS LETTERS, 1995, 66 (02) : 148 - 150