PULSE PLASMA DEPOSITION OF CUBIC BORON-NITRIDE THIN-FILMS ON SILICON SUBSTRATE

被引：0
|
作者：
YAN, PX
YANG, SZ
机构：
[1] Institute of Physics, Academia Sinica, Beijing
来源：
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1994年 / 145卷 / 01期
关键词：
D O I：
10.1002/pssa.2211450254
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
[No abstract available]
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页码：K29 / K32
页数：4
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