TOPOLOGICAL ELECTRON-DENSITY ANALYSIS OF ORGANOSULFUR COMPOUNDS

被引:9
|
作者
BACHRACH, SM
SALZNER, U
机构
[1] Department of Chemistry, Northern Illinois University, DeKalb
来源
基金
美国国家科学基金会;
关键词
AB INITIO CALCULATION; ORGANOSULFUR COMPOUND; TOPOLOGICAL ELECTRON DENSITY ANALYSIS;
D O I
10.1016/0166-1280(94)04117-B
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The geometries and topological electron density analysis of 19 organosulfur compounds were determined at the HF/6-31G* level. This computational method provides geometries in excellent agreement with experiment. We provide a database of topological electron density values for a variety of C-S bonds which can be used for comparisons with other molecules. An exponential relationship between bond order and the value of the electron density at the C-S bond critical point is developed and used to investigate the degree of delocalization in prop-2-enethial, thiophene and the conjugate base of thioacetaldehyde.
引用
收藏
页码:201 / 207
页数:7
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