STUDY OF RESIDUAL STRAINS IN HORIZONTAL-BRIDGMAN-GROWN GALLIUM-ARSENIDE WAFERS BY A HIGH-SENSITIVITY COMPUTER-CONTROLLED INFRARED POLARISCOPE

被引:3
|
作者
YAMADA, M
机构
[1] Department of Electronics and Information Science, Kyoto Institute of Technology, Matsugasaki, Sakyoku
关键词
D O I
10.1063/1.354679
中图分类号
O59 [应用物理学];
学科分类号
摘要
Residual strains in GaAs (100) wafers, sliced from single-crystal ingots grown by the horizontal Bridgman technique, have for the first time been characterized by measuring strain-induced birefringence with a high-sensitivity computer-controlled infrared polariscope. The residual strain components: \S(r)-S(t)\, \S(yy)-S(zz)\, and 2\S(yz)\ are quantitatively characterized from the measured birefringence values. It was found that the maximum strain value was as low as about 5 X 10(-6) and the corresponding stress value was about 3 X 10(5) N/m2. Also there was no strong correlation between the measured residual strain and etch pit density distributions. The origin of residual strains is discussed in conjunction with the correlation between the residual strain and dislocation distributions.
引用
收藏
页码:2436 / 2439
页数:4
相关论文
共 2 条