X-RAY-LITHOGRAPHY BREAKS THE SUBMICROMETER BARRIER

被引：9
|
作者：
LEPSELTER, MP
机构：
来源：
IEEE SPECTRUM | 1981年 / 18卷 / 05期
关键词：
D O I：
10.1109/MSPEC.1981.6369505
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Integrated circuit manufacture
引用
收藏
页码：26 / 29
页数：4
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