ROLE OF NITROGEN IN DRY DESTRUCTION BY LOW-TEMPERATURE ASHING IN A LOW-PRESSURE OXYGEN ATMOSPHERE IN A MICROWAVE PLASMA

The dry destruction of organic matrices by low-temperature ashing in a low-pressure atmosphere of oxygen gas in a microwave plasma is generally thought to be caused by one or more of the possible forms of active oxygen. This study showed, however, than in the presence of nitrogen the rate of destruction, at the same temperature, is up to four times higher than in its absence. © 1990.