THE INFLUENCE OF OXIDE SURFACE-LAYERS ON BULK ELECTRON-PROBE MICROANALYSIS OF OXYGEN - APPLICATION TO TI-SI-O COMPOUNDS

被引:16
|
作者
GOLDSTEIN, JI
CHOI, SK
VANLOO, FJJ
HEIJLIGERS, HJM
BASTIN, GF
SLOOF, WG
机构
[1] EINDHOVEN UNIV TECHNOL,SOLID STATE CHEM & MAT SCI LAB,5600 MB EINDHOVEN,NETHERLANDS
[2] DELFT UNIV TECHNOL,MET LAB,DELFT,NETHERLANDS
关键词
ELECTRON PROBE MICROANALYSIS; LIGHT ELEMENT ANALYSIS; OXIDE LAYERS; SURFACE CONTAMINATION; TI-SI-O COMPOUNDS;
D O I
10.1002/sca.4950150310
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
This paper discusses a generalized method to measure with the electron probe microanalyzer (EPMA) the oxygen in a material containing a surface oxide layer. The continuum background is the most difficult to measure, particularly for materials in which oxygen-free samples cannot be produced. The method depends on the preparation of either oxygen-free samples or well characterized oxygen-containing samples. Specific application of the method to the Ti-Si-O system is discussed. In addition, measurements of oxide surface-layer thickness of 3.6-8.0 nm on Ti and Ti-Si compounds were obtained using EPMA and a scanning Auger microprobe (SAM). The nature of the oxide surface layers was shown using x-ray photoelectron spectroscopy (XPS).
引用
收藏
页码:165 / 170
页数:6
相关论文
共 15 条