EPITAXIAL-GROWTH OF HIGH-TEMPERATURE SUPERCONDUCTING THIN-FILMS

被引：20
|
作者：
ECKSTEIN, JN
SCHLOM, DG
HELLMAN, ES
VONDESSONNECK, KE
CHEN, ZJ
WEBB, C
TURNER, F
HARRIS, JS
BEASLEY, MR
GEBALLE, TH
机构：
[1] STANFORD UNIV,DEPT ELECT ENGN,STANFORD,CA 94305
[2] STANFORD UNIV,DEPT APPL PHYS,STANFORD,CA 94305
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 02期
关键词：
D O I：
10.1116/1.584741
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：319 / 323
页数：5
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