MISORIENTED SUPERIMPOSED DIFFRACTION GRATINGS FORMED BY AN ELECTRON-BEAM IN AMORPHOUS ARSENIC SULFIDE FILMS

被引：0
|
作者：
SERGEEV, SA
SIMASHKEVICH, AA
SHUTOV, SD
机构：
来源：
KVANTOVAYA ELEKTRONIKA | 1994年 / 21卷 / 10期
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Superimposed phase diffraction grating were formed by an electron beam in amorphous arsenic sulfide (As2S3) films. The number of superimposed gratings was N = 2 - 10 and the misorientation angle was pi/N. The electron-beam-stimulated modulation of the refractive index n1 = = 10(-3)-10(-2) of the superimposed gratings was studied as a function of the number of these gratings. The main factor which limited the number of mutually independent superimposed gratings was the limit of linearity of the response of the recording medium at the nodal regions where the total radiation dose was maximal.
引用
收藏
页码：991 / 993
页数：3
相关论文
共 50 条
  • [1] Binary Superimposed Gratings Formed by e-Beam Recording in Amorphous AsS Films
    Sergeev, S. A.
    Iovu, M. S.
    Enachi, M. A.
    JOURNAL OF NANOELECTRONICS AND OPTOELECTRONICS, 2014, 9 (02) : 291 - 294
  • [2] Structural and kinetic aspects of electron-beam crystallization of amorphous films of antimony sulfide
    Bagmut, Aleksandr
    Bagmut, Ivan
    MOLECULAR CRYSTALS AND LIQUID CRYSTALS, 2021, 720 (01) : 26 - 37
  • [3] ELECTRON-DIFFRACTION FROM GRATINGS FABRICATED BY ELECTRON-BEAM NANOLITHOGRAPHY
    ITO, Y
    BLELOCH, AL
    PATERSON, JH
    BROWN, LM
    ULTRAMICROSCOPY, 1993, 52 (3-4) : 347 - 352
  • [4] Diffraction Structures Formed by Two Crossed Superimposed Diffraction Gratings
    S. A. Sergeev
    A. Yu. Meshalkin
    M. S. Iovu
    Surface Engineering and Applied Electrochemistry, 2021, 57 : 207 - 216
  • [5] Diffraction Structures Formed by Two Crossed Superimposed Diffraction Gratings
    Sergeev, S. A.
    Meshalkin, A. Yu
    Iovu, M. S.
    SURFACE ENGINEERING AND APPLIED ELECTROCHEMISTRY, 2021, 57 (02) : 207 - 216
  • [6] Electron-beam recording of the diffraction gratings in the (As4S3Se3)1-xSnx amorphous thin films
    Iovu, M. S.
    Sergeev, S. A.
    Iaseniuc, O., V
    OPTOELECTRONICS AND ADVANCED MATERIALS-RAPID COMMUNICATIONS, 2018, 12 (7-8): : 377 - 380
  • [7] SUPERIMPOSED EQUALLY ORIENTED DIFFRACTION GRATINGS FORMED IN As2S3 FILMS
    Sergeev, S. A.
    Iovu, M. S.
    Meshalkin, A. Yu
    CHALCOGENIDE LETTERS, 2020, 17 (01): : 25 - 31
  • [8] HYDROGENATION OF ELECTRON-BEAM EVAPORATED AMORPHOUS SILICON FILMS
    FRITZSCHE, H
    TSAI, CC
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1979, 24 (03): : 399 - 399
  • [9] Neutron diffraction of titanium aluminides formed by continuous electron-beam treatment
    Valkov, S.
    Neov, D.
    Luytov, D.
    Petrov, P.
    19TH INTERNATIONAL SUMMER SCHOOL ON VACUUM, ELECTRON AND ION TECHNOLOGIES (VEIT2015), 2016, 700
  • [10] ELECTRON PHASE GRATINGS BY ELECTRON-BEAM NANOLITHOGRAPHY
    ITO, Y
    BLELOCH, AL
    GRANLEESE, SJR
    BROWN, LM
    ELECTRON MICROSCOPY AND ANALYSIS 1993, 1993, (138): : 507 - 510
12345