SIO2 DOPED SI3N4 CERAMICS

被引:0
|
作者
TAKAHASHI, T [1 ]
ISOMURA, M [1 ]
ENDOH, Y [1 ]
FURUSE, Y [1 ]
机构
[1] TOKYO ELECT POWER CO LTD,CHOFU,TOKYO 182,JAPAN
来源
SILICON NITRIDE 93 | 1994年 / 89-9卷
关键词
SI3N4; SIO2; HIGH TEMPERATURE PROPERTIES; SIC PARTICLE DISPERSION;
D O I
暂无
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The mechanical properties and stability of a SiO2 doped Si3N4 ceramic were investigated up to 1600 degrees C. Specimens were prepared by the encapsulation-HIP process of SiO2 doped Si3N4 powder compacts. The hipped material showed almost constant strength around 600MPa between RT and 1600 degrees C. The steady-state creep rare at 200MPa and 1500 degrees C was 5.6X10(-6)/hr, which was equivalent to that of a typical rare earth oxide doped Si3N4 ceramic at 1400 degrees C. It showed good oxidation resistance and was stable at 1600 degrees C in air. Since transgranular fracture and elongated beta-Si3N4 grains were observed in the microstructure, it was considered that the materials showed low toughness because of the rigid grain boundaries. It was concluded that the SiO2 doped Si3N4 ceramic can be possibly used above 1400 degrees C. but the fracture toughness should be improved.
引用
收藏
页码:225 / 228
页数:4
相关论文
共 50 条
  • [1] LVV SPECTRA OF SI,SIO2 AND SI3N4
    JOHANNESSEN, JS
    SPICER, WE
    STRAUSSER, YE
    [J]. PHYSICA SCRIPTA, 1979, 19 (04): : 355 - 359
  • [2] SOME MECHANICAL PROPERTIES OF SI3N4/SI AND SI3N4/SIO2/SI SYSTEMS
    MACKENNA, EL
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (07) : C249 - &
  • [3] Tribology of Si3N4 Ceramics Depending on Amount of Added SiO2 Nanocolloid
    Nam, Ki Woo
    Chung, Young Kyu
    Hwang, Seok Hwan
    Kim, Jong Soon
    Moon, Chang Kwon
    [J]. TRANSACTIONS OF THE KOREAN SOCIETY OF MECHANICAL ENGINEERS A, 2011, 35 (03) : 267 - 272
  • [4] Solubility of Si3N4 in liquid SiO2
    Gu, H
    Cannon, RM
    Seifert, HJ
    Hoffmann, MJ
    Tanaka, I
    [J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 2002, 85 (01) : 25 - 32
  • [5] Preparation and Properties of Porous Si3N4/SiO2/BN Composite Ceramics
    Dong, Wei
    Wang, Chang-An
    Yu, Lei
    Ouyang, Shi-Xi
    [J]. HIGH-PERFORMANCE CERAMICS VII, PTS 1 AND 2, 2012, 512-515 : 828 - +
  • [6] Solubility of Si3N4 in liquid SiO2
    [J]. Gu, H., 1600, American Ceramic Society (85):
  • [7] DEFECT CONTROL IN SI3N4/SI3N4/SIO2 STRUCTURES FOR ISOLATION PROCESSES
    CLAEYS, C
    LEUVEN, KV
    VANHELLEMONT, J
    DECLERCK, G
    VANLANDUYT, J
    VANOVERSTRAETEN, R
    AMELINCKX, S
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (03) : C84 - C84
  • [8] Franz Dispersion Relation for Tunneling Simulations in Polycrystalline Silicon/SiO2/Si3N4/SiO2/Si and TaN/Al2O3/Si3N4/SiO2/Si Structures
    Vexler, Mikhail I.
    Kuligk, Angelika
    Meinerzhagen, Bernd
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 2009, 48 (05) : 05DE011 - 05DE015
  • [9] Track formation in SiO2/Si and Si3N4/Si structures
    Alzhanova, A. Ye.
    Dauletbekova, A. K.
    [J]. BULLETIN OF THE UNIVERSITY OF KARAGANDA-PHYSICS, 2015, 2 (78): : 4 - 8
  • [10] LOW-TEMPERATURE DEPOSITION OF SiO2, Si3N4 OR SiO2-Si3N4.
    Anon
    [J]. IBM technical disclosure bulletin, 1986, 28 (09):